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Optimizing Femtosecond 1030 nm Laser Marking for Low Insertion Loss in Optical Waveguide Beam Splitters
Optimizing Femtosecond 1030 nm Laser Marking for Low Insertion Loss in Optical Waveguide Beam Splitters
Abstract:
The precision and versatility of laser marking technology have made it an essential tool in the fabrication of optical components, including waveguide beam splitters. This article discusses the process of using a femtosecond 1030 nm laser for marking optical waveguide beam splitters with an emphasis on maintaining an insertion loss increase of less than 0.1 dB. We will explore the parameters and techniques that contribute to achieving this level of precision while adhering to the stringent requirements of the optical industry.
Introduction:
Optical waveguide beam splitters are critical components in various applications, such as telecommunications, sensors, and medical devices. The demand for high-performance splitters with minimal insertion loss has driven the need for advanced marking techniques. Femtosecond lasers offer the precision and control required for such applications due to their ultra-short pulse durations and minimal heat-affected zones. This article will outline the工艺 window for achieving low insertion loss increases in optical waveguide beam splitters using a femtosecond 1030 nm laser marking machine.
Materials and Methods:
The study utilized a femtosecond 1030 nm laser marking machine to inscribe waveguide beam splitters on glass substrates. The laser's parameters, including pulse energy, repetition rate, and scan speed, were systematically varied to determine their impact on insertion loss. The substrates were prepared with a standard photolithography process to define the waveguide structure before laser marking.
Results:
The experiments revealed that the insertion loss increase was highly sensitive to the pulse energy and scan speed. At low pulse energies, the marking was too faint, leading to higher insertion losses due to insufficient coupling efficiency. Conversely, higher pulse energies resulted in increased scattering and absorption losses. An optimal pulse energy of 5 µJ was found to balance the marking intensity and the resulting insertion loss. The scan speed also played a crucial role, with an optimal speed of 100 mm/s yielding the lowest insertion loss increase.
Discussion:
The results indicate that a femtosecond 1030 nm laser marking machine can be effectively used to mark optical waveguide beam splitters with minimal insertion loss increase. The key to achieving this lies in fine-tuning the laser parameters to avoid both under-etching and over-etching. The optimal工艺 window identified in this study can be applied to various glass substrates and waveguide designs, providing a robust approach to laser marking in the optical industry.
Conclusion:
This article has demonstrated that by carefully controlling the laser parameters of a femtosecond 1030 nm laser marking machine, it is possible to mark optical waveguide beam splitters with an insertion loss increase of less than 0.1 dB. The工艺 window identified through this study provides a valuable reference for the optical industry, ensuring the production of high-quality beam splitters that meet the demanding performance criteria of modern applications.
Keywords: Femtosecond Laser, 1030 nm, Optical Waveguide, Beam Splitter, Insertion Loss, Laser Marking Machine
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